First Nano has announced the shipment of a Silicon-Germanium Chemical Vapor Deposition System to CEA Grenoble. The EasyTube 3000, Easy Gas and Easy Exhaust systems were configured specifically for Silicon-Germanium Nanowires and are, to the best of our knowledge, the first commercial turn-key system offered for this type of material growth.
The SiNaPS laboratory will use the system to further develop research programs on semiconductor nanowires. These programs are in close collaboration with the Laboratorie des Technologies de la Microelectronique (LTM) and the Centre National de la Recherche Scientifique (CNRS) which also took part in funding the system.
"The purchase of the EasyTube3000 will enlarge the spectrum of our research with the growth of heterostructured nanowires, their doping, and with the possibility to extend the growth to a wide variety of other materials thanks to the liquid precursor kits.
Our projects cover fundamental aspects (growth, carrier transport … ) as well as potential applications (Nano Electronics, Solar Energy, Nanophotonics, MEMS and Sensors," states Pascal Gentile, Engineer from CEA.
To date, SiGe Nanowires have been produced in a few research laboratories by UHVCVD. It remains a challenge to control the diameter, length, uniformity and purity of the synthesized SiGe Nanowires because of their low dimensionality.
First Nano's EasyTube ET3000 system provides the precise control of pressure, chemical delivery and temperature for SiGe Nanowire synthesis. "The integrated turn-key system expands our international installed base of equipment designed for enabling tomorrow's technology," states Gary Dyal, Director, Marketing/Sales of First Nano.
